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Dual Beam FIB/SEM


The Zeiss Dual Beam FIB/SEM instrument is located in SERF 101. It is not only used as high resolution Scanning electron microscope but can be used together with an scanning focused ion beam. Uses include TEM sample preparation and micro-machining. We can also slice and image successively to get tomographic 3D images of small objects from cells to proteins and nano-wires.

Dual Beam

  • Electron and ion beam can be used simultaneously
  • Enables cross-sectional SEM tomography
  • Observation and positioning of ion beam
  • Observation while ion beam is cutting

Focused Ion Beam

  • Gallium liquid metal ion source
  • Resolution is 7 nm at 30kV acceleration voltage
  • Acceleration Voltage 5 to 30 kV
  • Singel Source Gas Injection system

Scanning Electron Microscope

  • FEG electron source
  • High resolution SEM 1nm at 15kV and 1.9nm at 1kV
  • Acceleration Voltage 0.1 to 15 kV
  • High efficient in-lens and in-chamber
  • Secondary Electron (SE) Detector
  • Back-Scattered Electron (BSE) Detector
  • STEM capabilities for low voltage transmission imaging
    • Four-quadrant Dark Field annualr detector
    • Bright-Field detector

Large specimen exchange chamber

  • Nano-fabrication
  • Nano-mechanical testing and other special capabilities


  • TEM sample prep
  • Nano-manipulation of all sorts

Computer control

  • Increase of efficiency and precision
  • Remote control and online collaboration

Existing users may book time via Stratocore. New users contact Dr. Evans.