The University of Tennessee, Knoxville

Joint Institute for Advanced Materials


Plasmatherm PECVD

Plasmatherm PECVD

The Plasmatherm Shuttelock SLR-730-PECVD system is equipped to grow poly-silicon, silicon oxide, silicon nitride, and silicon oxide. The system is also capable of growing other carbon-containing films, such as graphene.

Plasmatherm PECVD Quick Start Guide


 

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